Work

Impact of line width roughness on the matching performances of next-generation devices

Year: 2007

Type: article

Source: Thin Solid Films

DOI: 10.1016/j.tsf.2007.08.117

Authors: C. Gustin, L.H.A. Leunissen, A. Mercha, S. Decoutere, G. Lorusso

Institution: IMEC

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: European Commission

OpenAlex ID: W2017847422

FWCI: 1.528

Cites: 11

Cited by: 25

Related to: 10