Work

Formation of (100)-Textured Si Film Using an Excimer Laser on a Glass Substrate

Year: 2003

Type: article

Abstract: We investigated the texture of excimer-laser crystallized Si film. For the first time, Si thin films with more than 96% (100) texture have been produced using excimer-laser crystallization of a-Si on a glass substrate. The (100) textured film has rectangular grains with edges parallel to the (110) direction. Results of scanning electron microscopy (SEM), electron backscatter diffraction patterns (EBSP), X-ray diffraction and transmission electron microscopy (TEM) are presented. The results are interpreted on the basis of Si/SiO 2 interface energy and a new grain-selection model.

Source: Japanese Journal of Applied Physics

DOI: 10.1143/jjap.42.l135

Authors: Dharam Pal Gosain, Akio Machida, Toshio Fujino, Yukihisa Hitsuda, Kazushi Nakano, Junichi Sato

Institution: Sony (Japan)

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W2018376760

FWCI: 2.979

Cites: 1

Cited by: 33

Related to: 10