Work

An atomistic approach to the initiation mechanism of galling

Year: 2005

Type: article

Source: Computational Materials Science

DOI: 10.1016/j.commatsci.2005.08.006

Authors: L. Vitos, K. Larsson, B. Johansson, M. Hanson, S. Hogmark

Institutions: Uppsala University, Institute for Solid State Physics and Optics, KTH Royal Institute of Technology

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2018644735

FWCI: 4.171

Cites: 21

Cited by: 36

Related to: 10