Work

Base developable negative tone molecular resist based on epoxide cross-linking

Year: 2015

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2086039

Authors: Brandon Sharp, Richard A. Lawson, Ashten Fralick, Hannah Narcross, Jun Sung Chun, Mark Neisser, Laren M. Tolbert, Clifford L. Henderson

Institutions: Georgia Institute of Technology, SUNY Polytechnic Institute

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2019401607

FWCI: 0.833

Cites: 13

Cited by: 6

Related to: 10