Optimization of cleanliness and oxidation in plasma doped photoresist strip
Year: 2012
Type: conference-paper
Source: AIP conference proceedings
DOI: 10.1063/1.4766546
Authors: J. DeLuca, A. B. Lee, S. W. Jin, I. S. Jang, J. Hou, D. Mattson, S. Luo, A. Scuderi, Y. J. Yang, I. Berry, D. Roh
Institution: Axcelis Technologies (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Funder: SK Hynix
OpenAlex ID: W2020182887