Work

Towards ultimate optical lithography with NXT:1950i dual stage immersion platform

Year: 2010

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.847025

Authors: Tom Castenmiller, Frank van de Mast, Toine de Kort, Coen van de Vin, Marten de Wit, Raf Stegen, Stefan van Cleef

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2020295449

FWCI: 4.278

Cites: 4

Cited by: 90

Related to: 10