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Author

Marten de Wit

Institution: ASML (Netherlands)
Observed institution: ASML (Netherlands)
OpenAlex ID: A5022656339
Towards ultimate optical lithography with NXT:1950i dual stage immersion platform
2010 · Tom Castenmiller, Frank van de Mast, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 90
Extending KrF lithography beyond 80nm with the TWINSCAN XT:1000H 0.93NA scanner
2008 · Wim de Boeij, Gerald Dicker, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Cost-effective shrink of semi-critical layers using the TWINSCAN XT:1000H NA 0.93 KrF scanner
2009 · Frank Bornebroek, Marten de Wit, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Works count: 3
Citation count: 96
H-index: 2
I10-index: 1
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