Work

Extending KrF lithography beyond 80nm with the TWINSCAN XT:1000H 0.93NA scanner

Year: 2008

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.805381

Authors: Wim de Boeij, Gerald Dicker, Marten de Wit, Frank Bornebroek, Mark Zellenrath, Harm-Jan Voorma, Bart Smeets, Rene Toussaint, Bart Paarhuis, Marteijn de Jong, Dirk Hellweg, Klaus Kornitzer

Institutions: ASML (Netherlands), Carl Zeiss (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2075697240

FWCI:

Cites: 5

Cited by: 5

Related to: 10