Work

Multisource optimization of a column for electron lithography

Year: 2000

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.1321752

Authors: M. Mankos, S. Coyle, A. Fernandez, A. Sagle, P. Allen, W. Owens, J. Sullivan, T. H. P. Chang

Institution: Applied Materials (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Defense Advanced Research Projects Agency

OpenAlex ID: W2020368209

FWCI: 3.381

Cites: 14

Cited by: 27

Related to: 10