Localized Oxidation of the Cu Surface after Chemical Mechanical Planarization Processing
Year: 2005
Type: article
DOI: 10.1143/jjap.44.8396
Authors: Masako Kodera, Yukiko Nishioka, Shohei Shima, Akira Fukunaga, Manabu Tsujimura
Institutions: Toshiba (Japan), Ebara (Japan)
Language: English
Subfield: Industrial and Manufacturing Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2020989945