Electron-beam-induced pattern etching of AlGaAs using an ultrathin GaAs oxide as a resist
Year: 1990
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.346325
Authors: M. Taneya, Y. Sugimoto, H. Hidaka, K. Akita
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2032964064