Work

Silicon nitride and oxynitride deposition by RT-LPCVD

Year: 1997

Type: article

Source: Thin Solid Films

DOI: 10.1016/s0040-6090(96)09333-9

Authors: B. Semmache, M. Lemiti, Ch. Chanelière, Ch. Dubois, A. Sibai, B. Canut, A. Laugier

Institutions: Institut National des Sciences Appliquées de Lyon, Lyon 1 Université

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2034097243

FWCI: 3.846

Cites: 13

Cited by: 25

Related to: 10