Work

Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition

Year: 2010

Type: article

Source: Surface and Coatings Technology

DOI: 10.1016/j.surfcoat.2010.02.071

Authors: M. Matsuoka, S. Isotani, W. Sucasaire, L.S. Zambom, K. Ogata

Institutions: Universidade de São Paulo, Faculdade de Tecnologia de São Paulo, Centro Paula Souza, Nissin Electric Co., Ltd. (Japan)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

Funders: Conselho Nacional de Desenvolvimento Científico e Tecnológico, Japan International Cooperation Agency

OpenAlex ID: W2034868942

FWCI: 1.43

Cites: 32

Cited by: 64

Related to: 10