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Wilmer Sucasaire

Observed names: Sucasaire, Wilmer, W Sucasaire, W. Sucasaire
ORCID: 0000-0003-4657-6526
Observed ORCID: 0000-0003-4657-6526
OpenAlex ID: A5079700097
X-ray photoelectron spectroscopy analysis of zirconium nitride-like films prepared on Si(100) substrates by ion beam assisted deposition
2007 · M. Matsuoka, S. Isotani, et al. · Surface and Coatings Technology · 77
Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition
2010 · M. Matsuoka, S. Isotani, et al. · Surface and Coatings Technology · 64
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X-Ray Photoelectron Spectroscopy and Raman Spectroscopy Studies on Thin Carbon Nitride Films Deposited by Reactive RF Magnetron Sputtering
2012 · Masao Matsuoka, Sadao Isotani, et al. · World Journal of Nano Science and Engineering · 46
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Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted deposition
2006 · Wilmer Sucasaire, Masao Matsuoka, et al. · Journal of the Brazilian Chemical Society · 17
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Study of Columnar Growth Polycrystalline (Sn, Cr) co-doped In2O3 films deposited by sputtering technique for potential gas sensors applications
2018 · A.F. Carlos-Chilo, L.G. Luza-Mamani, et al. · Vacuum · 15
Lattice strain effects on the structural properties and band gap tailoring in columnarly grown Fe-doped SnO 2 films deposited by DC sputtering
2019 · Y B Guillen-Baca, C A Vilca Huayhua, et al. · Journal of Physics D Applied Physics · 7
Filmes Finos De Nitreto De Carbono E Nitreto De Boro Preparados Com Método De Deposição Assistida Por Feixe De Íons
2008 · Makoto Matsuoka, W. Sucasaire, et al. · LA Referencia (Red Federada de Repositorios Institucionales de Publicaciones Científicas)
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Caracterização De Filmes Finos De Nitreto De Índio Formados Por Deposição Assistida Por Feixe De Íons
2008 · K. C. Lopes, M. Matsuoka, et al. · Revista Brasileira de Aplicações de Vácuo
Montagem E Caracterização Do Sistema De Deposição Assistida Por Feixe De Íons
2008 · Karina C. Lopes, Makoto Matsuoka, et al. · Revista Brasileira de Aplicações de Vácuo
Works count: 11
Citation count: 226
H-index: 6
I10-index: 5
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