Work

Innovative techniques for improving overlay accuracy by using DCM (device correlated metrology) targets as reference

Year: 2014

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2046671

Authors: Wei-Jhe Tzai, Simon C. C. Hsu, Howard Chen, Charlie Chen, Yuan Chi Pai, Chun-Chi Yu, Chia Ching Lin, Tal Itzkovich, Lipkong Yap, Eran Amit, David Tien, Eros Huang, Kelly T. L. Kuo, Nuriel Amir

Institutions: United Microelectronics (Taiwan), KLA (Israel), KLA (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2039636639

FWCI: 1.204

Cites: 2

Cited by: 3

Related to: 10