Work

The Anomalous Diffusion of Gallium in Silicon

Year: 1971

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.1143/jjap.10.1745

Authors: Yoshio Nakajima, Shinji Ohkawa

Institution: Fujitsu (Japan)

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2043732572

FWCI: 0.372

Cites: 3

Cited by: 1

Related to: 10