Raman investigations of elastic strain relief in Si1−xGex layers on patterned silicon substrate
Year: 1993
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.355335
Authors: B. Dietrich, E. Bugiel, H. J. Osten, P. Zaumseil
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2045836804