Work

Analysis of Airborne Boron and Phosphorus Contaminations on Wafer Surface by TOF-SIMS

Year: 2006

Type: conference-paper

Source: IEEE International Conference on Semiconductor Electronics

DOI: 10.1109/smelec.2006.380720

Authors: Mo Zhiqiang, Gui Dong, Hua Younan, Zhao Siping, Xing Zhenxiang

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2050834574

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