Work

Ion bombardment energy control for selective fluorocarbon plasma etching of organosilicate glass

Year: 2004

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.1676641

Authors: R. Silapunt, A. E. Wendt, K. Kirmse, L. P. Losey

Institutions: University of Wisconsin–Madison, Texas Instruments (United States)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Semiconductor Research Corporation

OpenAlex ID: W2051925228

FWCI: 0.95

Cites: 19

Cited by: 12

Related to: 10