Work

Study on microstructural, chemical and electrical properties of tantalum nitride thin films deposited by reactive direct current magnetron sputtering

Year: 2010

Type: article

Source: Microsystem Technologies

DOI: 10.1007/s00542-009-0993-0

Authors: Michaela Grosser, M. Münch, J. Brenner, M. Wilke, H. Seidel, C. Bienert, A. Roosen, U. Schmid

Institutions: Saarland University, AC2T Research (Austria), Friedrich-Alexander-Universität Erlangen-Nürnberg, TU Wien

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Deutsche Forschungsgemeinschaft

OpenAlex ID: W2052043901

FWCI: 2.476

Cites: 34

Cited by: 21

Related to: 10