Work

A novel technique for in situ measurements of thin film properties

Year: 1985

Type: article

Source: Thin Solid Films

DOI: 10.1016/0040-6090(85)90302-5

Author: K. Hieber

Institution: Siemens (Germany)

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2056860089

FWCI: 0.783

Cites: 8

Cited by: 2

Related to: 10