Work

High rate reactive sputtering using gas pulsing: a technique for the creation of films onto large, flat substrates

Year: 1999

Type: article

Source: Thin Solid Films

DOI: 10.1016/s0040-6090(99)00081-4

Authors: R.P. Howson, N. Danson, I. Safi

Institution: Loughborough University

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2058776344

FWCI: 2.111

Cites: 9

Cited by: 26

Related to: 10