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R.P. Howson

Observed names: R P Howson, R P. Howson, R. P. HOWSON, R. P. Howson, R.P Howson, R.P. HOWSON, Ronald P Howson, Ronald P. Howson, Ronald Philip Howson
OpenAlex ID: A5111709372
Laser mirror damage in germanium at 10.6 μm
1973 · D. C. Emmony, R. P. Howson, et al. · Applied Physics Letters · 403
Characterisation of aluminium oxynitride gas barrier films
2001 · A.G Erlat, B.M Henry, et al. · Thin Solid Films · 128
A microstructural study of transparent metal oxide gas barrier films
1999 · B.M Henry, F Dinelli, et al. · Thin Solid Films · 108
The formation and control of direct current magnetron discharges for the high-rate reactive processing of thin films
1989 · R. P. Howson, A. G. Spencer, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 80
Use of the magnetron-sputtering technique for the control of the properties of indium tin oxide thin films
1999 · S. Bhagwat, R.P. Howson · Surface and Coatings Technology · 70
Pressure stability in reactive magnetron sputtering
1988 · A.G. Spencer, R.P. Howson, et al. · Thin Solid Films · 64
Deposition of transparent heat-reflecting coatings of metal oxides using reactive planar magnetron sputtering of a metal and/or alloy
1981 · R.P Howson, M.I Ridge · Thin Solid Films · 55
Substrate effects from an unbalanced magnetron
1990 · R.P. Howson, H.A. J'Afer, et al. · Thin Solid Films · 51
Composition and conductivity of fluorine-doped conducting indium oxide films prepared by reactive ion plating
1981 · J.N. Avaritsiotis, R.P. Howson · Thin Solid Films · 43
Techniques for the sputtering of optimum indium-tin oxide films on to room-temperature substrates
1998 · N. Danson, I. Safi, et al. · Surface and Coatings Technology · 38
The design and performance of planar magnetron sputtering cathodes
1987 · A.G. Spencer, C.A. Bishop, et al. · Vacuum · 35
Fluorine doping of IN2O3 films employing ion-plating techniques
1981 · J.N. Avaritsiotis, R.P. Howson · Thin Solid Films · 35
Effects of nitrogen pressure and ion flux on the properties of direct current reactive magnetron sputtered Zr–N films
1995 · Shozo Inoue, Kikuo Tominaga, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 34
Design and use of a vacuum system for high rate reactive sputtering of TiO2/TiN/TiO2 solar control films
1988 · A.G. Spencer, M. Georgson, et al. · Solar Energy Materials · 31
Properties of conducting transparent oxide films produced by ion plating onto room-temperature substrates
1979 · R. P. Howson, J. N. Avaratsiotis, et al. · Applied Physics Letters · 30
Indium oxide film formation by O2 cluster ion-assisted deposition
1998 · Wei Qin, Ronald Philip Howson, et al. · Materials Chemistry and Physics · 28
Production of transparent electrically conducting films by ion plating
1981 · R.P. Howson, M.I. Ridge, et al. · Thin Solid Films · 28
Reactive sputtering of electrically conducting tin oxide
1991 · R.P. Howson, H. Barankova, et al. · Thin Solid Films · 27
Temperature dependence of Hall mobility in indium–tin oxide thin films
1980 · J. E. Morris, M. I. Ridge, et al. · Journal of Applied Physics · 27
The optical properties of evaporated silicon oxide films
1972 · R.P Howson, A Taylor · Thin Solid Films · 27
High rate reactive sputtering using gas pulsing: a technique for the creation of films onto large, flat substrates
1999 · R.P. Howson, N. Danson, et al. · Thin Solid Films · 26
Dynamic control of reactive magnetron sputtering: A theoretical analysis
1990 · A.G. Spencer, R.P. Howson · Thin Solid Films · 24
Reactive sputtering with an unbalanced magnetron
1992 · R. P. Howson, H. A. Ja’fer · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 23
Formation of transparent heat mirrors by ion plating onto ambient temperature substrates
1979 · R.P. Howson, J.N. Avaritsiotis, et al. · Thin Solid Films · 23
The reactive sputtering of oxides and nitrides
1994 · R. P. Howson · Pure and Applied Chemistry · 21
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Works count: 96
Citation count: 1,915
H-index: 23
I10-index: 46
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