Work

Evaluation of phase-edge phase-shifting mask for sub-0.18-μm gate patterns in logic devices

Year: 1998

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.310780

Authors: DongHo Cha, Jongwook Kye, Nakgeuon Seong, Hoyoung Kang, Hanku Cho, Joo-Tae Moon

Institutions: Samsung Electronics (South Korea), Samsung (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2064045772

FWCI: 1.285

Cites:

Cited by: 2

Related to: 10