Work

Determination of the proximity parameters in electron beam lithography using doughnut-structures

Year: 1986

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/0167-9317(86)90040-7

Authors: L. Stevens, R. Jonckheere, E. Froyen, S. Decoutere, D. Lanneer

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2064833486

FWCI:

Cites: 4

Cited by: 28

Related to: 10