Work

Experimental and simulation comparison of electron-beam proximity correction

Year: 2004

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.1808742

Authors: L. H. A. Leunissen, R. Jonckheere, U. Hofmann, N. Ünal, C. Kalus

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2065628979

FWCI: 0.633

Cites: 5

Cited by: 6

Related to: 10