Work

Evaluation of Si wire waveguide fabricated by parallel plate RIE process using double layered EB resist containing C60

Year: 2008

Type: conference-paper

Source: International Nano-Optoelectronics Workshop

DOI: 10.1109/inow.2008.4634546

Authors: Keita Inoue, Nobuhiko Nishiyama, Haruki Enomoto, Shigeo Tamura, Takeo Maruyama, Shigehisa Arai

Institutions: Tokyo Institute of Technology, Kanazawa University

Language: English

Topic: Photonic and Optical Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2065638129

FWCI:

Cites: 5

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Related to: 10