Work

Evaluation of Hitachi CAD to CD-SEM metrology package for OPC model tuning and product devices OPC verification

Year: 2005

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.601909

Authors: Pietro Cantu, Gianfranco Capetti, Chiara Catarisano, Fabrizio D'Angelo, Elena Evangelista, Ermes Severgnini, Silvia Trovati, Mauro Vasconi, Takumichi Sutani, Stephan Wahl, Robert Steffen

Institutions: STMicroelectronics (Italy), Hitachi High-Tech (Japan), Hitachi (Japan), Hitachi (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2067375372

FWCI: 1.129

Cites:

Cited by: 5

Related to: 10