Author

Mauro Vasconi

Observed institution: STMicroelectronics (Italy)

OpenAlex ID: A5018570700

Diffraction based overlay metrology: accuracy and performance on front end stack

2008 · Philippe Leray, Shaunee Cheng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 29

Differential signal scatterometry overlay metrology: an accuracy investigation

2007 · Daniel Kandel, Mike Adel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17

Evaluation of Hitachi CAD to CD-SEM metrology package for OPC model tuning and product devices OPC verification

2005 · Pietro Cantu, Gianfranco Capetti, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Overlay metrology for double patterning processes

2009 · Philippe Leray, Shaunee Cheng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

193-nm metrology: facing severe e-beam/resist interaction phenomena

2001 · Mauro Vasconi, Maddalena Bollin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Diffraction Based Overlay Metrology: Accuracy and Performance on Front End Stack

2008 · Philippe Leray, Stone Cheng, et al. · 2

Statistical Aspects of Size Functions for the Description of Random Shapes: Applications to Problems of Lithography in Microelectronics

2007 · Alessandra Micheletti, Filippo Terragni, et al. · Mathematics in industry · 1

Statistical shape analysis applied to microlithography

2006 · Alessandra Micheletti, Ermes Severgnini, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

First review of a suitable metrology framework for the 65-nm technology node

2003 · Ermes Severgnini, Mauro Vasconi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

In-chip optical CD measurements for non-volatile memory devices

2006 · Mauro Vasconi, Stephanie Kremer, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Advances in Scanning Electron Microscopy for Semiconductor Metrology

2003 · M Icroscopy A, Mauro Vasconi, et al.

Near and sub-half-micrometer geometry SEM metrology requirements for good process control

1995 · Christopher M. Cork, Paolo Canestrari, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 13

Citation count: 63

H-index: 4

I10-index: 2