Work

Diffraction based overlay metrology: accuracy and performance on front end stack

Year: 2008

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.772516

Authors: Philippe Leray, Shaunee Cheng, Daniel Kandel, Michael Adel, Anat Marchelli, Irina Vakshtein, Mauro Vasconi, Bartlomiej Salski

Institutions: IMEC, KLA (Israel), STMicroelectronics (Italy), Qwed (Poland)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: European Commission

OpenAlex ID: W1985707229

FWCI: 1.895

Cites:

Cited by: 29

Related to: 10