Epitaxial growth of β-FeSi2 on silicon (111): a real-time RHEED analysis
Year: 1992
Type: article
Source: Applied Surface Science
Authors: J. Chevrier, V. Le Thanh, S. Nitsche, J. Derrien
Institution: Centre National de la Recherche Scientifique
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2069217672