Work

Thermal oxidation of chemical vapour deposited tungsten layers on silicon substrates for embedded non-volatile memory application

Year: 2008

Type: article

Source: Thin Solid Films

DOI: 10.1016/j.tsf.2008.12.036

Authors: Rakesh Sohal, Christian Walczyk, Peter Zaumseil, Dirk Wolansky, Alexander Fox, Bernd Tillack, Hans-Joachim Müssig, Thomas Schroeder

Institution: Leibniz Institute for High Performance Microelectronics

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2070529862

FWCI: 2.916

Cites: 41

Cited by: 35

Related to: 10