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Rakesh Sohal

Pulse-induced low-power resistive switching in HfO2 metal-insulator-metal diodes for nonvolatile memory applications
2009 · Ch. Walczyk, Ch. Wenger, et al. · Journal of Applied Physics · 110
Comparative study of NH4OH and HCl etching behaviours on AlGaN surfaces
2009 · Rakesh Sohal, Piotr Dudek, et al. · Applied Surface Science · 42
Thermal oxidation of chemical vapour deposited tungsten layers on silicon substrates for embedded non-volatile memory application
2008 · Rakesh Sohal, Christian Walczyk, et al. · Thin Solid Films · 35
Synchrotron radiation x-ray photoelectron spectroscopy study on the interface chemistry of high-k PrxAl2−xO3 (x=0–2) dielectrics on TiN for dynamic random access memory applications
2007 · T. Schroeder, G. Lupina, et al. · Journal of Applied Physics · 35
Improving the dielectric constant of Al2O3 by cerium substitution for high-k MIM applications
2009 · Rakesh Sohal, Grzegorz Lupina, et al. · Surface Science · 23
Al-oxynitrides as a buffer layer for Pr2O3/SiC interfaces
2006 · Rakesh Sohal, Mohamed Torche, et al. · Materials Science in Semiconductor Processing · 19
PrOAlN dielectrics for metal insulator semiconductor stacks
2010 · Karsten Henkel, Mohamed Torche, et al. · physica status solidi (a) · 7
Structural characterization of crystallized Si thin film material by HRTEM and Raman spectroscopy
2010 · Teimuraz Mchedlidze, Maryam Beigmohamadi, et al. · physica status solidi (a) · 6
Resonant photoemission at the oxygen K edge as a tool to study the electronic properties of defects at SiO2 /Si and SiO2 /SiC interfaces
2006 · Massimo Tallarida, Rakesh Sohal, et al. · Superlattices and Microstructures · 6
Pr-O-N Dielectrics for MIS Stacks on Silicon and Silicon Carbide Surfaces
2006 · Karsten Henkel, Mohamed Torche, et al. · MRS Proceedings · 3
WITHDRAWN: Tailored cerium-aluminate high-k dielectric thin films for metal–insulator–metal device applications
2009 · Rakesh Sohal, Grzegorz Lupina, et al. · Thin Solid Films
Al-Oxynitride as a buffer layer for high-k dielectrics
2008 · Karsten Henkel, Y. Burkov, et al.
Al-Oxynitride Buffer Layer Facilities for PrOX/SiC Interfaces
2007 · Karsten Henkel, Rakesh Sohal, et al. · MRS Proceedings
PrOx/AlON stacks as a high-k candidate on SiC
2007 · Karsten Henkel, Rakesh Sohal, et al.
CVD growth of (001) and (111) 3C-SiC epilayers and their interface reactivity with praseodymium oxide dielectric layers
2006 · Rakesh Sohal
Works count: 15
Citation count: 286
H-index: 7
I10-index: 6
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