Selective chemical etching of polycrystalline SiGe alloys with respect to Si and SiO2
Year: 1992
Type: article
Source: Journal of Electronic Materials
DOI: 10.1007/bf02665519
Institution: North Carolina State University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2073781422