Work

Degradation of Gate Oxide Integrity by Metal Impurities

Year: 1989

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.1143/jjap.28.l2109

Authors: Kazuo Hiramoto, Masakazu Sano, Shinsuke Sadamitsu, Nobukatsu Fujino

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2083173886

FWCI: 0.923

Cites: 6

Cited by: 48

Related to: 10