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Laser reactive ablation deposition of silicon-nitride films

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Year: 1995
Type: article
Source: Applied Physics A
DOI: 10.1007/bf01538403
Authors: M. L. Giorgi, G. Leggieri, A. Luches, M. Martino, A. Perrone, G. Majni, P. Mengucci, J. Zemek, I. N. Mihailescu
Institutions: University of Salento, Czech Academy of Sciences, FZU - Institute of Physics of the Czech Academy of Sciences, Institutul de Fizică Atomică
Language: English

Topic: Laser Material Processing Techniques
Subfield: Industrial and Manufacturing Engineering
Field: Engineering
Domain: Physical Sciences

Open Access status: closed
OpenAlex ID: W2090737720
FWCI: 8.132
Cites: 18
Cited by: 34
Related to: 10
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