Work

Measurement and control of reagent concentrations in MOCVD reactor using ultrasonics

Year: 1992

Type: article

Source: Journal of Crystal Growth

DOI: 10.1016/0022-0248(92)90371-o

Authors: J.P. Stagg, J. Christer, E.J. Thrush, J. Crawley

Institution: Thomas Swan (United Kingdom)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2091589937

FWCI: 4.172

Cites: 3

Cited by: 44

Related to: 10