Work

Overlay accuracy with respect to device scaling

Year: 2012

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.918017

Authors: Philippe Leray, David Laidler, Shaunee Cheng

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2092390858

FWCI: 1.621

Cites:

Cited by: 5

Related to: 10