Work

Investigations of Metal Gate Electrodes on HfO2 Gate Dielectrics

Year: 2004

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-811-d4.1

Authors: Jamie Schaeffer, Sri Samavedam, Leonardo Fonseca, Cristiano Capasso, Olubunmi Adetutu, David Gilmer, Chris Hobbs, Eric Luckowski, Rich Gregory, Zhi-Xiong Jiang, Yong Liang, Karen Moore, Darrell Roan, Bich-Yen Nguyen, Phil Tobin, Bruce White

Institution: Motorola (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2115335285

FWCI: 0.317

Cites: 28

Cited by: 5

Related to: 10