Work

Characterization of Spatial Intrafield Gate CD Variability, Its Impact on Circuit Performance, and Spatial Mask-Level Correction

Year: 2004

Type: article

Source: IEEE Transactions on Semiconductor Manufacturing

DOI: 10.1109/tsm.2003.822735

Authors: M. Orshansky, L. Milor, C. Hu

Institutions: The University of Texas at Austin, Georgia Institute of Technology, University of California System

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Advanced Micro Devices

OpenAlex ID: W2117608378

FWCI: 9.187

Cites: 10

Cited by: 99

Related to: 10