Work

Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings

Year: 2010

Type: article

Source: IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

DOI: 10.1109/tcad.2010.2042882

Authors: Tejas Jhaveri, Vyacheslav Rovner, Lars Liebmann, Larry Pileggi, Andrzej J. Strojwas, Jason D. Hibbeler

Institutions: PDF Solutions (United States), Carnegie Mellon University, IBM (United States)

Language: English

Topic: VLSI and FPGA Design Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2124007645

FWCI: 10.05

Cites: 47

Cited by: 98

Related to: 10