Work

Sub-10-nm-Scale Lithography Usingp-chloromethyl-methoxy-calix[4]arene Resist

Year: 2003

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.1143/jjap.42.3913

Authors: Masahiko Ishida, Jun-ichi Fujita, Takashi Ogura, Yukinori Ochiai, Eiji Ohshima, Junji Momoda

Institutions: NEC (Japan), Tokuyama (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2136013341

FWCI: 6.619

Cites: 11

Cited by: 68

Related to: 10