Author

Yukinori Ochiai

Observed names: Ochiai, Yukinori, Y Ochiai, Y. Ochiai, Yukinori OCHIAI, Yukinori Ochiai Yukinori Ochiai

Institutions: Systems Design Lab, Graduate School of Engineering, The University of Tokyo, The University of Tokyo

Observed institutions: Hiroshima University, NEC (Japan), Chiba University, Japan Aerospace Exploration Agency, Japan Science and Technology Agency, NEC (United States), Japan Fine Ceramics Center, Systems Design Lab, Graduate School of Engineering, The University of Tokyo, National Institute of Advanced Industrial Science and Technology, The University of Tokyo, The University of Osaka

ORCID: 0009-0006-4908-100X

Observed ORCID: 0009-0006-4908-100X

OpenAlex ID: A5111570950

Ultrahigh resolution of calixarene negative resist in electron beam lithography

1996 · J. Fujita, Y. Ohnishi, et al. · Applied Physics Letters · 242

Focused ion beam applications to solid state devices

1996 · Shinji Matsui, Yukinori Ochiai · Nanotechnology · 172

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Patterns in the bulk growth of carbon nanotubes

1993 · T.W. Ebbesen, H. Hiura, et al. · Chemical Physics Letters · 163

Free-space-wiring fabrication in nano-space by focused-ion-beam chemical vapor deposition

2003 · Takahiko Morita, Reo Kometani, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 125

Effects of thermal annealing on porous silicon photoluminescence dynamics

1992 · Norio Ookubo, Haruhiko Ono, et al. · Applied Physics Letters · 115

Observation and characteristics of mechanical vibration in three-dimensional nanostructures and pillars grown by focused ion beam chemical vapor deposition

2001 · J. Fujita, M. Ishida, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 102

Room-temperature nanoimprint and nanotransfer printing using hydrogen silsequioxane

2003 · S. Matsui, Y. Igaku, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 91

Room temperature replication in spin on glass by nanoimprint technology

2001 · S. Matsui, Y. Igaku, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 88

Diameter-Controlled Carbon Nanotubes Grown from Lithographically Defined Nanoparticles

2004 · Masahiko Ishida, Hiroo Hongo, et al. · Japanese Journal of Applied Physics · 82

In situObservation of Carbon-Nanopillar Tubulization Caused by Liquidlike Iron Particles

2004 · Toshinari Ichihashi, Jun-ichi Fujita, et al. · Physical Review Letters · 81

Nanomanipulator and actuator fabrication on glass capillary by focused-ion-beam-chemical vapor deposition

2004 · Reo Kometani, Takahiko Morita, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 76

Focused ion beam-induced fabrication of tungsten structures

2003 · M. Ishida, J. Fujita, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 73

Development of three-dimensional pattern-generating system for focused-ion-beam chemical-vapor deposition

2003 · T. Hoshino, K. Watanabe, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 73

Carbon nanopillar laterally grown with electron beam-induced chemical vapor deposition

2003 · J. Fujita, M. Ishida, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 70

Sub-10-nm-Scale Lithography Usingp-chloromethyl-methoxy-calix[4]arene Resist

2003 · Masahiko Ishida, Jun-ichi Fujita, et al. · Japanese Journal of Applied Physics · 68

Nanometer-scale resolution of calixarene negative resist in electron beam lithography

1996 · J. Fujita, Y. Ohnishi, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 67

Sub-10-nm planar-bulk-CMOS devices using lateral junction control

2004 · H. Wakabayashi, S. Yamagami, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 65

Liquid metal alloy ion sources for B, Sb, and Si

1981 · K. Gamo, T. Ukegawa, et al. · Journal of Vacuum Science and Technology · 65

Growth of three-dimensional nano-structures using FIB-CVD and its mechanical properties

2003 · J. Fujita, M. Ishida, et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 60

Density estimation for amorphous carbon nanopillars grown by focused ion beam assisted chemical vapor deposition

2002 · Masahiko Ishida, Jun-ichi Fujita, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 56

Support materials based on converted aluminum films for chemical vapor deposition growth of single-wall carbon nanotubes

2003 · H. Hongo, F. Nihey, et al. · Chemical Physics Letters · 55

Nozzle-Nanostructure Fabrication on Glass Capillary by Focused-Ion-Beam Chemical Vapor Deposition and Etching

2003 · Reo Kometani, Takahiko Morita, et al. · Japanese Journal of Applied Physics · 55

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Room Temperature Nanoimprint Technology Using Hydrogen Silsequioxane (HSQ)

2002 · Yutaka Igaku, Shinji Matsui, et al. · Japanese Journal of Applied Physics · 53

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Nanofabrication toward sub-10 nm and its application to novel nanodevices

1999 · J Sone, J Fujita, et al. · Nanotechnology · 48

Luminescent properties of visible and near-infrared emissions from porous silicon prepared by the anodization method

1992 · Y. Mochizuki, M. Mizuta, et al. · Physical review. B, Condensed matter · 46

Works count: 170

Citation count: 3,877

H-index: 38

I10-index: 89