Work

Multipass gray printing for the new MEBES 4500S mask lithography system

Year: 1997

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.277295

Authors: Frank E. Abboud, Robert L. Dean, Janine J. Doering, W. Eckes, Mark A. Gesley, Ulrich Hofmann, Terry Mulera, Robert J. Naber, M. Pastor, Wayne Phillips, John Raphael, Frederick Raymond III, Charles A. Sauer

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2136378632

FWCI: 2.563

Cites:

Cited by: 5

Related to: 10