NEAR EDGE X-RAY ABSORPTION AND X-RAY PHOTOELECTRON DIFFRACTION STUDIES OF THE STRUCTURAL ENVIRONMENT OF Ge – Si SYSTEMS
Year: 2000
Type: article
Source: Surface Review and Letters
Institutions: Università di Camerino, Université Paris-Sud
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2139662913