Work

Effect of Plasma Treatment and TMCTS Vapor Annealing on the Reinforcement of Porous low-k Films

Year: 2005

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-863-b3.10

Authors: Kazuo Kohmura, Hirofumi Tanaka, Shunsuke Oike, Masami Murakami, Tetsuo Ono, Yutaka Seino, Takamaro Kikkawa

Institutions: National Institute of Advanced Industrial Science and Technology, Hiroshima University

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2140995083

FWCI: 0.9

Cites: 4

Cited by: 6

Related to: 10