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Kazuo Kohmura

Dissolution of Zeolite in Acidic and Alkaline Aqueous Solutions As Revealed by AFM Imaging
1996 · Sadaaki Yamamoto, Shoko Sugiyama, et al. · The Journal of Physical Chemistry · 75
Effect of moisture adsorption on the properties of porous-silica ultralow-k films
2006 · Y. Uchida, S. Hishiya, et al. · Microelectronic Engineering · 38
Novel organosiloxane vapor annealing process for improving properties of porous low-k films
2006 · K. Kohmura, H. Tanaka, et al. · Thin Solid Films · 28
Influence of Humidity on Electrical Characteristics of Self-Assembled Porous Silica Low-k Films
2005 · T. Kikkawa, S. Kuroki, et al. · Journal of The Electrochemical Society · 27
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Carbon loss induced by plasma beam irradiation in porous silica films
2007 · K. Kurihara, T. Ono, et al. · Journal of Applied Physics · 18
Young’s modulus evaluation by SAWs for porous silica low-k film with cesium doping
2010 · X. Xiao, X.M. Shan, et al. · Microelectronic Engineering · 17
Theoretical Investigation of Dielectric Constant and Elastic Modulus of Three-Dimensional Isotropic Porous Silica Films with Cubic and Disordered Pore Arrangements
2005 · Hidenori Miyoshi, Kazuhiro Yamada, et al. · Japanese Journal of Applied Physics · 17
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A Novel Organosiloxane Vapor Annealing Process for Improving Elastic Modulus of Porous Low-k Films
2004 · Kazuo Kohmura, Shunsuke Oike, et al. · MRS Proceedings · 16
32 nm node Ultralow-k(k=2.1)/Cu Damascene Multilevel Interconnect using High-Porosity (50 %) High-Modulus (9 GPa) Self-Assembled Porous Silica
2007 · S. Chikaki, K. Kinoshita, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 12
Effect of Water Adsorption on Electrical Characteristics of Porous Silica Films
2008 · Yasuhisa Kayaba, Kazuo Kohmura, et al. · Japanese Journal of Applied Physics · 11
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Development of a novel closed EUV pellicle for EUVL manufacturing
2016 · Yosuke Ono, Kazuo Kohmura, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Cu-Oxide-Assisted Selective Pyrolysis of Organic Nanolayer on Patterned SiO2–Cu Surface
2015 · Yasuhisa Kayaba, Shoko Sugiyama Ono, et al. · ACS Applied Materials & Interfaces · 9
Solder and Organic Adhesive Hybrid Bonding Technology with Non-strip Type Photosensitive Resin and Injection Molded Solder (IMS)
2022 · Keiji Matsumoto, Takahito Watanabe, et al. · IEEE Electronic Components and Technology Conference (ECTC) · 8
Infrared spectroscopic analysis of siloxane network modification of mesoporous silica film by silylation and cesium doping
2010 · Yasuhsia Kayaba, Kazuo Kohmura, et al. · Thin Solid Films · 7
New Thin Adhesive for High Density 2.5D Heterogeneous Device Integration with Cu-Cu Hybrid Bonding
2019 · Yasuhisa Kayaba, Yuzo Nakamura, et al. · IMAPSource Proceedings · 6
Electrical Reliabilities of Highly Cross-Linked Porous Silica Film with Cesium Doping
2008 · Yasuhisa Kayaba, Kazuo Kohmura, et al. · Journal of The Electrochemical Society · 6
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Recovery from Plasma-Process-Induced Damage in Porous Silica Low-k Films by Organosiloxane Vapor Annealing
2006 · Tetsuo Ono, Keizo Kinoshita, et al. · Japanese Journal of Applied Physics · 6
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Effect of Plasma Treatment and TMCTS Vapor Annealing on the Reinforcement of Porous low-k Films
2005 · Kazuo Kohmura, Hirofumi Tanaka, et al. · MRS Proceedings · 6
Novel self-assembled ultra-low-k porous silica films with high mechanical strength for 45 nm BEOL technology
2004 · Y. Oku, K. Yamada, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 6
A Thin Adhesive for 3D/2.5D Si Chip Stacking at Low Temperature
2021 · Yasuhisa Kayaba, Yuzo Nakamura, et al. · IEEE International Interconnect Technology Conference (IITC) · 5
Development of closed-type EUV pellicle
2018 · Yosuke Ono, Kazuo Kohmura, et al. · Photomask and next-generation lithography mask technology. Conference · 5
Ultralow-k/Cu Damascene Multilevel Interconnects Using High Porosity and High Modulus Self-Assembled Porous Silica
2010 · Shinichi Chikaki, Keizo Kinoshita, et al. · Journal of The Electrochemical Society · 5
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Removal of etching/ashing residues and ashing/wet-clean damage in porous silica low-k films
2006 · T. Yamanishi, T. Ono, et al. · Microelectronic Engineering · 5
Evaluation of Ultra-thin Layer Fabricated by Wet-process as a Pore-Seal for Porous Low-k Films
2011 · Shoko Sugiyama Ono, Kazuo Kohmura, et al. · MRS Proceedings · 3
Pure Silica Zeolite Films Prepared by a Vapor Phase Transport Method
2008 · Yoshinori Cho, Toshiki Seo, et al. · Japanese Journal of Applied Physics · 3
Works count: 57
Citation count: 380
H-index: 10
I10-index: 10
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