Work

Mask substrate birefringence requirements for hyper-NA lithography

Year: 2006

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.659057

Authors: Mark van de Kerkhof, Wim de Boeij, Marcel Demarteau, Bernd Geh, Leonardus H. A. Leunissen, Patrick Martin, Mike Cangemi

Institutions: ASML (Netherlands), ASML (United States), Carl Zeiss (United States), IMEC, Photronics (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2147995205

FWCI: 1.055

Cites:

Cited by: 8

Related to: 10