Work

New Single Wafer Double Sided Spin Cleaning Method

Year: 2001

Type: article

Source: Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

DOI: 10.4028/www.scientific.net/ssp.76-77.203

Authors: Walter Starflinger, Reinhard Sellmer, Stefan Detterbeck, Alfred Lechner, Jörg Leberzammer, Hans-Jürgen Kruwinus

Institutions: Infineon Technologies (Germany), OTH Regensburg

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2155199552

FWCI:

Cites:

Cited by: 2

Related to: 10