Work

Process Stabilization and Sensitivity Analyses of a Single Recess GaAs pHEMT Process using Device Simulations

Year: 2008

Type: conference-paper

Source: European Microwave Integrated Circuits Conference

DOI: 10.1109/emicc.2008.4772227

Authors: Peter Abele, Michael Schafer, Jorg Splettstosser, Martin Thinnes, Hermann Stieglauer, Dag Behammer

Institution: United Monolithic Semiconductors (Germany)

Language: English

Topic: Radio Frequency Integrated Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2156449752

FWCI:

Cites: 3

Cited by: 2

Related to: 10